Chemical Vapor Deposition

Chemical vapor deposition (CVD) uses gaseous components as precursors to a chemical reaction forming an intrinsically pure solid. The process takes place at elevated temperatures and reduced pressures, typically on graphite surfaces. This slow and deliberate process demands about a week to yield a batch of pyrolytic boron nitride materials.

Our furnaces maintain temperatures as high as 2000 C for up to 10 days. To add to the challenge, they sustain interior pressures of less than half a torr with variations of no more than a millitorr throughout the deposition cycle.

The CVD process produces a highly uniform coating, creating shapes nearly identical to the mold, reducing manufacturing costs and delivering end products made to tighter specifications